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A Three-dimensional simulation study of the performance of Carbon Nanotube Field Effect Transistors with doped reservoirs and realistic geometry

机译:碳纳米管性能的三维模拟研究   具有掺杂储层的纳米管场效应晶体管及其实际应用   几何

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摘要

In this work, we simulate the expected device performance and the scalingperspectives of Carbon nanotube Field Effect Transistors (CNT-FETs), with dopedsource and drain extensions. The simulations are based on the self-consistentsolution of the 3D Poisson-Schroedinger equation with open boundary conditions,within the Non-Equilibrium Green's Function formalism, where arbitrary gategeometry and device architecture can be considered. The investigation of shortchannel effects for different gate configurations and geometry parameters showsthat double gate devices offer quasi ideal subthreshold slope and DIBL withoutextremely thin gate dielectrics. Exploration of devices with parallel CNTs showthat On currents per unit width can be significantly larger than the siliconcounterpart, while high-frequency performance is very promising.
机译:在这项工作中,我们模拟了具有掺杂的源极和漏极扩展的预期器件性能以及碳纳米管场效应晶体管(CNT-FET)的缩放比例。模拟是基于非平衡格林函数形式主义中具有开放边界条件的3D Poisson-Schroedinger方程的自洽解,其中可以考虑任意门几何和器件架构。对不同栅极配置和几何参数的短沟道效应的研究表明,双栅极器件可提供理想的亚阈值斜率和DIBL,而无需极薄的栅极电介质。对具有平行CNT的器件的研究表明,每单位宽度的导通电流可能比硅对应器件大得多,而高频性能非常有前途。

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